Rapid thermal processed thin films of reactively sputtered Ta2O5

A. Pignolet; G. Mohan Rao; S. B. Krupanidhi

doi:10.1016/0040-6090(94)06322-2

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Rapid thermal processed thin films of reactively sputtered Ta2O5

A. Pignolet G. Mohan Rao S. B. Krupanidhi

Year: 1995 Journal: Thin Solid Films Vol: 258 (1-2)Pages: 230-235 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(94)06322-2

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Keywords:

Tantalum pentoxide Materials science Dielectric Thin film Amorphous solid Permittivity Sputter deposition Silicon Annealing (glass) Sputtering Optoelectronics Relative permittivity Tantalum Amorphous silicon Leakage (economics) Electronic engineering Composite material Metallurgy Nanotechnology Crystalline silicon Chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Rapid thermal processed thin films of reactively sputtered Ta2O5

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