Material characteristics and electrical property of reactively sputtered RuO2 thin films

J. C. A. Huang

doi:10.1016/s0040-6090(00)01777-6

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Material characteristics and electrical property of reactively sputtered RuO2 thin films

J. C. A. Huang

Year: 2001 Journal: Thin Solid Films Vol: 382 (1-2)Pages: 139-145 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(00)01777-6

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Keywords:

Electrical resistivity and conductivity Crystallinity Thin film Annealing (glass) Materials science Sputtering Analytical Chemistry (journal) Oxygen Scanning electron microscope Mineralogy Grain size Composite material Chemistry Nanotechnology

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Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Material characteristics and electrical property of reactively sputtered RuO2 thin films

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