Microstructural and electrical characteristics of reactively sputtered ZrNx thin films

Jian‐Long Ruan; Ding‐Fwu Lii; Horng‐Hwa Lu; Jen‐Sue Chen; Jow-Lay Huang

doi:10.1016/j.jallcom.2008.11.103

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Microstructural and electrical characteristics of reactively sputtered ZrNx thin films

Jian‐Long Ruan Ding‐Fwu Lii Horng‐Hwa Lu Jen‐Sue Chen Jow-Lay Huang

Year: 2008 Journal: Journal of Alloys and Compounds Vol: 478 (1-2)Pages: 671-675 Publisher: Elsevier BV

DOI: 10.1016/j.jallcom.2008.11.103

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Keywords:

X-ray photoelectron spectroscopy Analytical Chemistry (journal) Thin film Stoichiometry Materials science Electrical resistivity and conductivity Sputtering Lattice constant Residual resistivity Microstructure Impurity Nitrogen Oxygen Chemistry Diffraction Metallurgy Nanotechnology Chemical engineering Physical chemistry Optics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Microstructural and electrical characteristics of reactively sputtered ZrNx thin films

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REACTIVELY SPUTTERED VANADIUM DIOXIDE THIN FILMS