JOURNAL ARTICLE

Microstructural and electrical characteristics of reactively sputtered ZrNx thin films

Jian‐Long RuanDing‐Fwu LiiHorng‐Hwa LuJen‐Sue ChenJow-Lay Huang

Year: 2008 Journal:   Journal of Alloys and Compounds Vol: 478 (1-2)Pages: 671-675   Publisher: Elsevier BV
Keywords:
X-ray photoelectron spectroscopy Analytical Chemistry (journal) Thin film Stoichiometry Materials science Electrical resistivity and conductivity Sputtering Lattice constant Residual resistivity Microstructure Impurity Nitrogen Oxygen Chemistry Diffraction Metallurgy Nanotechnology Chemical engineering Physical chemistry Optics

Metrics

16
Cited By
1.30
FWCI (Field Weighted Citation Impact)
32
Refs
0.80
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics

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