Electrical studies of reactively sputtered Fe-doped VO2 thin films

Terry Phillips; R. A. Murphy; T. O. Poehler

doi:10.1016/0025-5408(87)90241-8

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Electrical studies of reactively sputtered Fe-doped VO2 thin films

Terry Phillips R. A. Murphy T. O. Poehler

Year: 1987 Journal: Materials Research Bulletin Vol: 22 (8)Pages: 1113-1123 Publisher: Elsevier BV

DOI: 10.1016/0025-5408(87)90241-8

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Keywords:

Electrical resistivity and conductivity Thin film Materials science Sputtering Doping Activation energy Analytical Chemistry (journal) Transition metal Semiconductor Metal Condensed matter physics Metallurgy Nanotechnology Chemistry Physical chemistry Optoelectronics

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Advanced Memory and Neural Computing

Physical Sciences → Engineering → Electrical and Electronic Engineering

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electrical studies of reactively sputtered Fe-doped VO2 thin films

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