Glow discharge deposition of tetramethylsilane films

Y. Catherine; A. Zamouche

doi:10.1007/bf00566009

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Glow discharge deposition of tetramethylsilane films

Y. Catherine A. Zamouche

Year: 1985 Journal: Plasma Chemistry and Plasma Processing Vol: 5 (4)Pages: 353-368 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00566009

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Keywords:

Tetramethylsilane Monomer Amorphous solid Chemistry Analytical Chemistry (journal) Oxygen Glow discharge Deposition (geology) X-ray photoelectron spectroscopy Kinetics Thin film Impurity Silicon Chemical engineering Materials science Polymer Organic chemistry Nanotechnology Plasma

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Glow discharge deposition of tetramethylsilane films

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