JOURNAL ARTICLE

Microwave glow discharge deposition of thin silicon nitride films

Milan Růžička

Year: 1974 Journal:   Czechoslovak Journal of Physics Vol: 24 (4)Pages: 465-468   Publisher: Springer Science+Business Media
Keywords:
Materials science Glow discharge Silicon nitride Thin film Microwave Optoelectronics Deposition (geology) Silicon Nitride Plasma Nanotechnology Layer (electronics) Computer science Physics

Metrics

2
Cited By
0.91
FWCI (Field Weighted Citation Impact)
3
Refs
0.78
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

Related Documents

JOURNAL ARTICLE

Deposition of Silicon Nitride Films by Microwave Glow Discharge

Yasuji ShimaTakao MiyazakiNobuo NakamuraEiichi AdachiTakeshi Tokuyama

Journal:   Japanese Journal of Applied Physics Year: 1973 Vol: 12 (2)Pages: 309-310
BOOK-CHAPTER

Amorphous Silicon Carbide Thin Films Produced in the Glow Discharge Deposition System

N. T. Tran

Springer proceedings in physics Year: 1989 Pages: 134-141
JOURNAL ARTICLE

Atomic Layer Deposition of Silicon Nitride Films on Gallium Arsenide Using a Glow Discharge

Yu. K. EzhovskiĭS. V. Mikhailovskii

Journal:   Russian Microelectronics Year: 2019 Vol: 48 (4)Pages: 229-235
JOURNAL ARTICLE

Molecular Layer Deposition of Silicon Nitride with Glow Discharge Activation

Yu. K. EzhovskiĭS. V. Mikhailovskii

Journal:   Russian Journal of Physical Chemistry A Year: 2018 Vol: 92 (3)Pages: 547-551
© 2026 ScienceGate Book Chapters — All rights reserved.