Thin SiO2 films on GaAs substrates

R. Fremunt; A. Šimeček

doi:10.1007/bf01587293

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Thin SiO2 films on GaAs substrates

R. Fremunt A. Šimeček

Year: 1973 Journal: Czechoslovak Journal of Physics Vol: 23 (3)Pages: 391-397 Publisher: Springer Science+Business Media

DOI: 10.1007/bf01587293

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Keywords:

Materials science Thin film Argon Optoelectronics Deposition (geology) Dielectric Permittivity Volumetric flow rate Chemical engineering Analytical Chemistry (journal) Nanotechnology Atomic physics Chemistry Thermodynamics

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Physical Sciences → Materials Science → Surfaces, Coatings and Films

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Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Thin SiO2 films on GaAs substrates

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