JOURNAL ARTICLE

Deposition properties of selective tungsten chemical vapor deposition

Wen-Kuan YehMao-Chieh ChenPei-Jan WangLu-Min LiuMou-Shiung Lin

Year: 1996 Journal:   Materials Chemistry and Physics Vol: 45 (3)Pages: 284-287   Publisher: Elsevier BV
Keywords:
Silane Chemical vapor deposition Deposition (geology) Volumetric flow rate Silicon Analytical Chemistry (journal) Tungsten Chemistry Ion plating Plasma-enhanced chemical vapor deposition Partial pressure Etching (microfabrication) Substrate (aquarium) Materials science Thin film Nanotechnology Metallurgy Composite material Layer (electronics) Oxygen Organic chemistry

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3
Cited By
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FWCI (Field Weighted Citation Impact)
7
Refs
0.14
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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