Anomalous Selective Tungsten- Growth by -Chemical- Vapor -Deposition

Yu-Jane Mei; Ting‐Chang Chang; Jeng-Dong Sheu; Wen‐Kuan Yeh; Fu‐Ming Pan; Chun‐Yen Chang

doi:10.1557/proc-427-399

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Anomalous Selective Tungsten- Growth by -Chemical- Vapor -Deposition

Yu-Jane Mei Ting‐Chang Chang Jeng-Dong Sheu Wen‐Kuan Yeh Fu‐Ming Pan Chun‐Yen Chang

Year: 1996 Journal: MRS Proceedings Vol: 427 Publisher: Cambridge University Press

DOI: 10.1557/proc-427-399

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Keywords:

Tungsten Materials science Chemical vapor deposition Auger electron spectroscopy Deposition (geology) Auger Nanotechnology Optoelectronics Metallurgy Atomic physics

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Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Anomalous Selective Tungsten- Growth by -Chemical- Vapor -Deposition

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