High density plasma chemical vapor deposition of diamond-like carbon films

Ana Paula Mousinho; Ronaldo Domingues Mansano; M. Massi; L.S. Zambom

doi:10.1016/s0026-2692(03)00065-x

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High density plasma chemical vapor deposition of diamond-like carbon films

Ana Paula Mousinho Ronaldo Domingues Mansano M. Massi L.S. Zambom

Year: 2003 Journal: Microelectronics Journal Vol: 34 (5-8)Pages: 627-629 Publisher: Elsevier BV

DOI: 10.1016/s0026-2692(03)00065-x

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Keywords:

Microelectronics Chemical vapor deposition Materials science Dielectric Diamond Diamond-like carbon Carbon film Plasma-enhanced chemical vapor deposition Electrical resistivity and conductivity Carbon fibers Deposition (geology) Plasma Thin film Analytical Chemistry (journal) Composite material Optoelectronics Nanotechnology Chemistry Electrical engineering Organic chemistry

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Topics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Carbon Nanotubes in Composites

Physical Sciences → Materials Science → Materials Chemistry

High density plasma chemical vapor deposition of diamond-like carbon films

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