High-density plasma chemical vapor deposition of amorphous carbon films

A Mousinho

doi:10.1016/s0925-9635(03)00371-6

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High-density plasma chemical vapor deposition of amorphous carbon films

A Mousinho

Year: 2003 Journal: Diamond and Related Materials Publisher: Elsevier BV

DOI: 10.1016/s0925-9635(03)00371-6

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Keywords:

Analytical Chemistry (journal) Chemical vapor deposition Plasma-enhanced chemical vapor deposition Dielectric Carbon film Amorphous solid Materials science Electrical resistivity and conductivity Amorphous carbon Ellipsometry Deposition (geology) Thin film Plasma Chemistry Optoelectronics Nanotechnology Crystallography

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Plasma Diagnostics and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

High-density plasma chemical vapor deposition of amorphous carbon films

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