JOURNAL ARTICLE

Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding

Ryotaro MoriKei HanaiYoshinori Matsumoto

Year: 2004 Journal:   IEEJ Transactions on Sensors and Micromachines Vol: 124 (10)Pages: 359-363   Publisher: Institute of Electrical Engineers of Japan

Abstract

Three dimensional structures on SU-8 photoresist were fabricated by gray-scale lithography. A thin glass substrate was plastered over with SU-8 and UV light was irradiated through the glass substrate. SU-8 structures with maximum 400μm height and strong adhesion to the substrate were achieved by the lithography technique. The relation between gray-scale value and the resist height were evaluated and the maximum surface roughness of the structure was 0.98μm. Three dimensional structures such as micro capillaries were fabricated on PDMS from the SU-8 structures by molding.

Keywords:
Photoresist Lithography Materials science Resist Fabrication Molding (decorative) X-ray lithography Surface finish Surface roughness Composite material Substrate (aquarium) Optics Nanotechnology Optoelectronics Layer (electronics)

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Citation History

Topics

Microfluidic and Capillary Electrophoresis Applications
Physical Sciences →  Engineering →  Biomedical Engineering
Electrowetting and Microfluidic Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
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