Fabrication of three-dimensional microstructure using maskless gray-scale lithography

Kentaro Totsu; Kenta Fujishiro; Shuji Tanaka; Masayoshi Esashi

doi:10.1016/j.sna.2005.12.008

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Fabrication of three-dimensional microstructure using maskless gray-scale lithography

Kentaro Totsu Kenta Fujishiro Shuji Tanaka Masayoshi Esashi

Year: 2006 Journal: Sensors and Actuators A Physical Vol: 130-131 Pages: 387-392 Publisher: Elsevier BV

DOI: 10.1016/j.sna.2005.12.008

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Keywords:

Photoresist Maskless lithography Fabrication Materials science Microlens Lithography Ultraviolet Photolithography Nanotechnology Optoelectronics Reactive-ion etching Etching (microfabrication) Optics Layer (electronics) Resist Electron-beam lithography Lens (geology)

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Advanced optical system design

Physical Sciences → Engineering → Biomedical Engineering

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Electrowetting and Microfluidic Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Fabrication of three-dimensional microstructure using maskless gray-scale lithography

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