Structural characterization of TiO2 thin films obtained by pulsed laser deposition

L. Escobar‐Alarcón; E. Haro‐Poniatowski; M.A. Camacho-López; M. Fernández‐Guasti; Javier Francisco Jiménez-Jarquín; A. Sánchez-Pineda

doi:10.1016/s0169-4332(98)00486-3

JOURNAL ARTICLE

Structural characterization of TiO2 thin films obtained by pulsed laser deposition

L. Escobar‐Alarcón E. Haro‐Poniatowski M.A. Camacho-López M. Fernández‐Guasti Javier Francisco Jiménez-Jarquín A. Sánchez-Pineda

Year: 1999 Journal: Applied Surface Science Vol: 137 (1-4)Pages: 38-44 Publisher: Elsevier BV

DOI: 10.1016/s0169-4332(98)00486-3

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Keywords:

Thin film Pulsed laser deposition Rutile Materials science Characterization (materials science) Raman spectroscopy Substrate (aquarium) Deposition (geology) Diffraction Analytical Chemistry (journal) Laser Optics Nanotechnology Chemical engineering Chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Chalcogenide Semiconductor Thin Films

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Structural characterization of TiO2 thin films obtained by pulsed laser deposition

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