Properties of magnetron sputtered hydrogenated amorphous and microcrystalline silicon films alloyed with germanium

Nobuo Saito; Tomoaki Terada; Tetsuo Yamaguchi

doi:10.1016/0022-3093(86)90055-4

ScienceGate Book Chapters

JOURNAL ARTICLE

Properties of magnetron sputtered hydrogenated amorphous and microcrystalline silicon films alloyed with germanium

Nobuo Saito Tomoaki Terada Tetsuo Yamaguchi

Year: 1986 Journal: Journal of Non-Crystalline Solids Vol: 83 (1-2)Pages: 42-48 Publisher: Elsevier BV

DOI: 10.1016/0022-3093(86)90055-4

Get Full-Text PDF Get Analytical Report

Keywords:

Microcrystalline Materials science Amorphous solid Photoconductivity Sputter deposition Hydrogen Amorphous silicon Optoelectronics Band gap Thin film Germanium Sputtering Silicon Analytical Chemistry (journal) Crystallography Nanotechnology Chemistry Crystalline silicon

Metrics

Cited By

0.92

FWCI (Field Weighted Citation Impact)

Refs

0.76

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Properties of magnetron sputtered hydrogenated amorphous and microcrystalline silicon films alloyed with germanium

Metrics

Topics

Related Documents

Properties of magnetron sputtered hydrogenated amorphous silicon

Properties of magnetron sputtered hydrogenated amorphous silicon

High photoconductivity in magnetron sputtered amorphous hydrogenated germanium films

High photoconductivity in dual magnetron sputtered amorphous hydrogenated silicon and germanium alloy films

Characterization of reactively magnetron sputtered hydrogenated amorphous silicon films