JOURNAL ARTICLE

High photoconductivity in magnetron sputtered amorphous hydrogenated germanium films

R. A. RudderJ. W. CookG. Lucovsky

Year: 1983 Journal:   Applied Physics Letters Vol: 43 (9)Pages: 871-873   Publisher: American Institute of Physics

Abstract

Undoped amorphous hydrogenated germanium films which exhibit photoconductivities greater than 10−6 (Ω cm)−1 at a 1.96-eV photon flux of 1015 photons/(cm2 s) with corresponding mobility lifetime products of 10−6 cm2/V have been grown by magnetron sputtering. The films were also characterized by measuring the infrared absorption, the optical obsorption, and the dark conductivity as a function of temperature.

Keywords:
Photoconductivity Germanium Amorphous solid Materials science Sputter deposition Cavity magnetron Optoelectronics Absorption (acoustics) Conductivity Analytical Chemistry (journal) Infrared Thin film Sputtering Optics Silicon Chemistry Crystallography Nanotechnology Physics Physical chemistry Composite material

Metrics

56
Cited By
5.80
FWCI (Field Weighted Citation Impact)
6
Refs
0.97
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Glass properties and applications
Physical Sciences →  Materials Science →  Ceramics and Composites
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry

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