JOURNAL ARTICLE

Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering

M. FenkerMartin BalzerH. KapplO. Banakh

Year: 2005 Journal:   Surface and Coatings Technology Vol: 200 (1-4)Pages: 227-231   Publisher: Elsevier BV
Keywords:
Materials science Tin Scanning electron microscope Titanium X-ray photoelectron spectroscopy Sputter deposition Sputtering Cavity magnetron Analytical Chemistry (journal) Metallurgy Thin film Energy-dispersive X-ray spectroscopy Magnesium Chemical engineering Composite material Nanotechnology Chemistry

Metrics

41
Cited By
2.65
FWCI (Field Weighted Citation Impact)
8
Refs
0.88
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics

Related Documents

JOURNAL ARTICLE

Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering

E. L. BoytsovaL. A. Leonova

Journal:   Bulletin of the Russian Academy of Sciences Physics Year: 2018 Vol: 82 (9)Pages: 1143-1147
JOURNAL ARTICLE

Properties of aluminium oxide thin films deposited by reactive magnetron sputtering

Kari KoskiJorma HölsäP. Juliet

Journal:   Thin Solid Films Year: 1999 Vol: 339 (1-2)Pages: 240-248
JOURNAL ARTICLE

Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

Chi-Tung HuangChi-Tung Huang

Journal:   Journal of Materials Science Letters Year: 1997 Vol: 16 (1)Pages: 59-61
JOURNAL ARTICLE

Structure and Properties of W-Ti Thin Films Deposited by Magnetron Sputtering

Guo Qi SunSun YongYonghua Duan

Journal:   Materials science forum Year: 2016 Vol: 849 Pages: 654-658
© 2026 ScienceGate Book Chapters — All rights reserved.