Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering

M. Fenker; Martin Balzer; H. Kappl; O. Banakh

doi:10.1016/j.surfcoat.2005.01.075

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Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering

M. Fenker Martin Balzer H. Kappl O. Banakh

Year: 2005 Journal: Surface and Coatings Technology Vol: 200 (1-4)Pages: 227-231 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2005.01.075

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Keywords:

Materials science Tin Scanning electron microscope Titanium X-ray photoelectron spectroscopy Sputter deposition Sputtering Cavity magnetron Analytical Chemistry (journal) Metallurgy Thin film Energy-dispersive X-ray spectroscopy Magnesium Chemical engineering Composite material Nanotechnology Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Some properties of (Ti,Mg)N thin films deposited by reactive dc magnetron sputtering

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