JOURNAL ARTICLE
Silicon trench etching in a multi-frequency discharge reactor
Š. Haščı́kA. HorniakováJ. Huran
Year: 1994 Journal: Vacuum Vol: 45 (8)Pages: 915-917 Publisher: Elsevier BV
Keywords:
Trench Etching (microfabrication) Materials science Diode Optoelectronics Silicon Dry etching Reactive-ion etching Planar Oxide Core (optical fiber) Analytical Chemistry (journal) Composite material Chemistry Metallurgy
Metrics
6
Cited By
0.89
FWCI (Field Weighted Citation Impact)
1
Refs
0.74
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
Plasma Applications and Diagnostics
Health Sciences → Medicine → Radiology, Nuclear Medicine and Imaging
Electrohydrodynamics and Fluid Dynamics
Physical Sciences → Engineering → Electrical and Electronic Engineering
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