JOURNAL ARTICLE

Film-thickness dependence of structural and electrical properties of boron-doped hydrogenated microcrystalline silicon prepared by radiofrequency magnetron sputtering

Akimori TabataJunya NakanoKoji MazakiKota Fukaya

Year: 2010 Journal:   Journal of Non-Crystalline Solids Vol: 356 (23-24)Pages: 1131-1134   Publisher: Elsevier BV
Keywords:
Materials science Microcrystalline Doping Sputter deposition Silicon Boron Optoelectronics Cavity magnetron Microcrystalline silicon Sputtering Thin film Nanotechnology Crystallography Chemistry Crystalline silicon

Metrics

8
Cited By
1.03
FWCI (Field Weighted Citation Impact)
30
Refs
0.80
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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