Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas

Nobuo Saito; H. Sannomiya; Tetsuo Yamaguchi; Nobutada Tanaka

doi:10.1007/bf00617174

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Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas

Nobuo Saito H. Sannomiya Tetsuo Yamaguchi Nobutada Tanaka

Year: 1984 Journal: Applied Physics A Vol: 35 (4)Pages: 241-247 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00617174

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Keywords:

Microcrystalline Materials science Photoconductivity Hydrogen Amorphous solid Analytical Chemistry (journal) Inert gas Sputtering Sputter deposition Amorphous silicon Partial pressure Silicon Thin film Optoelectronics Crystalline silicon Composite material Chemistry Crystallography Oxygen Nanotechnology

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Dependence of properties of hydrogenated microcrystalline and amorphous silicon films prepared by planar magnetron sputtering in inert gas

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