JOURNAL ARTICLE

Study of hydrogenated amorphous silicon nitride films prepared by RF magnetron sputtering

Anirban BandyopadhyayTarun Kanti BhattacharyyaRatnabali BanerjeeA. K. BatabyalA. K. Barua

Year: 1991 Journal:   Applied Physics A Vol: 52 (5)Pages: 339-343   Publisher: Springer Science+Business Media
Keywords:
Sputter deposition Materials science Sputtering Analytical Chemistry (journal) Electron cyclotron resonance Glow discharge Amorphous solid Nitride Silicon nitride Chemical vapor deposition Hydrogen Amorphous silicon Silicon Optoelectronics Thin film Plasma Chemistry Crystalline silicon Nanotechnology Layer (electronics)

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2
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19
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0.66
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Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry

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