JOURNAL ARTICLE

Electron spin resonance of hydrogenated amorphous silicon-carbon alloy films prepared by magnetron sputtering

Takato NakamuraNobuo SaitoYoshiko SuzukiYoichiro NakanishiGoro Shimaoka

Year: 1987 Journal:   Philosophical Magazine Letters Vol: 56 (4)Pages: 161-163   Publisher: Taylor & Francis

Abstract

Abstract New electron spin resonance (ESR) lines with g1 = 2·0017 and g2 and g3 = 2·0006 have been found in the ESR spectra of as-deposited a-Si1–x Cx:H films prepared by magnetron sputtering of silicon in the gas mixtures of methane and argon. Similarities between the observed spectra and those for the E′ centre in glassy SiO2 are discussed.

Keywords:
Electron paramagnetic resonance Argon Sputter deposition Silicon Amorphous solid Materials science Sputtering Methane Alloy Spectral line Analytical Chemistry (journal) Resonance (particle physics) Cavity magnetron Amorphous silicon Amorphous carbon Carbon fibers Nuclear magnetic resonance Chemistry Thin film Atomic physics Crystallography Metallurgy Composite material Crystalline silicon Nanotechnology Composite number Organic chemistry Physics

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Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Phase-change materials and chalcogenides
Physical Sciences →  Materials Science →  Materials Chemistry
Glass properties and applications
Physical Sciences →  Materials Science →  Ceramics and Composites

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