JOURNAL ARTICLE

Electrical properties of boron- and phosphorous-doped microcrystalline silicon thin films prepared by magnetron sputtering of heavily doped silicon targets

Weiyan WangJinhua HuangWei XuJunjun HuangYuheng ZengWeijie Song

Year: 2013 Journal:   Journal of Materials Science Materials in Electronics Vol: 24 (6)Pages: 2122-2127   Publisher: Springer Science+Business Media
Keywords:
Materials science Doping Microcrystalline Sputter deposition Silicon Thin film Electrical resistivity and conductivity Boron Analytical Chemistry (journal) Annealing (glass) Sputtering Mineralogy Optoelectronics Nanotechnology Metallurgy Crystallography Chemistry Electrical engineering

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5
Cited By
0.29
FWCI (Field Weighted Citation Impact)
17
Refs
0.58
Citation Normalized Percentile
Is in top 1%
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Citation History

Topics

Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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