Growth of carbon nitride using microwave plasma CVD

Yukihiro Sakamoto; Matsufumi TAKAYA

doi:10.1016/j.tsf.2004.08.040

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Growth of carbon nitride using microwave plasma CVD

Yukihiro Sakamoto Matsufumi TAKAYA

Year: 2004 Journal: Thin Solid Films Vol: 475 (1-2)Pages: 198-201 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2004.08.040

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Keywords:

Plasma Carbon nitride Nitride Materials science Microwave Carbon film Carbon fibers Nanotechnology Engineering physics Thin film Chemistry Composite material Computer science Engineering Physics Layer (electronics) Organic chemistry

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Topics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Growth of carbon nitride using microwave plasma CVD

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Citation History

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