Structural and optical properties of InN films prepared by radio frequency magnetron sputtering

Hiroyuki Shinoda; Nobuki Mutsukura

doi:10.1016/j.tsf.2005.08.377

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JOURNAL ARTICLE

Structural and optical properties of InN films prepared by radio frequency magnetron sputtering

Hiroyuki Shinoda Nobuki Mutsukura

Year: 2005 Journal: Thin Solid Films Vol: 503 (1-2)Pages: 8-12 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2005.08.377

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Keywords:

Indium nitride Lattice constant Raman spectroscopy Materials science Sputtering Analytical Chemistry (journal) Sputter deposition Thin film Band gap Nitride Substrate (aquarium) Stoichiometry Indium Diffraction Chemistry Optoelectronics Optics Nanotechnology Layer (electronics)

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GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Structural and optical properties of InN films prepared by radio frequency magnetron sputtering

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