JOURNAL ARTICLE
Buried Oxide in Silicon by Oxygen Implantation Into Scanned Wafers
A. Mogro‐CamperoR.P. LoveNathan S. LewisErnest L. HallM. D. McConnell
Year: 1985 Journal: MRS Proceedings Vol: 45 Publisher: Cambridge University Press
Keywords:
Materials science Wafer Annealing (glass) Silicon Silicon on insulator Oxygen Oxide Optoelectronics Composite material Metallurgy Chemistry
Metrics
2
Cited By
0.93
FWCI (Field Weighted Citation Impact)
5
Refs
0.75
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon and Solar Cell Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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