Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition

Wai-Chung Chan; Man‐Keung Fung; Kai-Ho Lai; Igor Bello; Shuit‐Tong Lee; Chun‐Sing Lee

doi:10.1016/s0022-3093(99)00443-3

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Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition

Wai-Chung Chan Man‐Keung Fung Kai-Ho Lai Igor Bello Shuit‐Tong Lee Chun‐Sing Lee

Year: 1999 Journal: Journal of Non-Crystalline Solids Vol: 254 (1-3)Pages: 180-185 Publisher: Elsevier BV

DOI: 10.1016/s0022-3093(99)00443-3

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Keywords:

Electron cyclotron resonance Amorphous carbon Auger electron spectroscopy Materials science Carbon film Chemical vapor deposition Carbon nitride Plasma-enhanced chemical vapor deposition Analytical Chemistry (journal) Nanoindentation Amorphous solid Thin film Composite material Nanotechnology Chemistry Crystallography Organic chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Mechanical properties of amorphous carbon nitride films synthesized by electron cyclotron resonance microwave plasma chemical vapor deposition

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