Hard nanocomposite Ti–Cu–N films prepared by d.c. reactive magnetron co-sputtering

Zhuguo Li; Shoji Miyake; Masao Kumagai; Hidenori Saito; Y. Muramatsu

doi:10.1016/j.surfcoat.2003.09.051

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Hard nanocomposite Ti–Cu–N films prepared by d.c. reactive magnetron co-sputtering

Zhuguo Li Shoji Miyake Masao Kumagai Hidenori Saito Y. Muramatsu

Year: 2003 Journal: Surface and Coatings Technology Vol: 183 (1)Pages: 62-68 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2003.09.051

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Keywords:

Materials science Nanocomposite Sputtering High-power impulse magnetron sputtering Cavity magnetron Sputter deposition Metallurgy Composite material Thin film Nanotechnology

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Hard nanocomposite Ti–Cu–N films prepared by d.c. reactive magnetron co-sputtering

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