JOURNAL ARTICLE

Etching mechanism of Bi4−xLaxTi3O12 films in Ar/Cl2 inductively coupled plasma

Keywords:
X-ray photoelectron spectroscopy Etching (microfabrication) Analytical Chemistry (journal) Chemistry Sputtering Inductively coupled plasma Langmuir probe Plasma Ion Thin film Plasma diagnostics Materials science Layer (electronics) Nanotechnology Nuclear magnetic resonance

Metrics

16
Cited By
0.00
FWCI (Field Weighted Citation Impact)
26
Refs
0.09
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Electronic and Structural Properties of Oxides
Physical Sciences →  Materials Science →  Materials Chemistry
Ferroelectric and Piezoelectric Materials
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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