JOURNAL ARTICLE
Ion beam-induced chemical vapor deposition with hexamethyldisilane for hydrogenated amorphous silicon carbide and silicon carbonitride films
Takaomi MatsutaniTatsuya AsanumaChang LiuMasato KiuchiTakae Takeuchi
Year: 2003 Journal: Surface and Coatings Technology Vol: 169-170 Pages: 624-627 Publisher: Elsevier BV
Keywords:
Materials science Amorphous solid Chemical vapor deposition Silicon Amorphous silicon Substrate (aquarium) Silicon carbide Ion beam Analytical Chemistry (journal) Ion Ion beam-assisted deposition Deposition (geology) Fourier transform infrared spectroscopy Chemical engineering Crystalline silicon Nanotechnology Optoelectronics Metallurgy Crystallography Organic chemistry Chemistry
Metrics
30
Cited By
1.22
FWCI (Field Weighted Citation Impact)
20
Refs
0.77
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Diamond and Carbon-based Materials Research
Physical Sciences → Materials Science → Materials Chemistry
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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