Photo-chemical vapor deposition of hydrogenated amorphous silicon films

Nobuki Mutsukura; Y. Machi

doi:10.1007/bf00702661

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Photo-chemical vapor deposition of hydrogenated amorphous silicon films

Nobuki Mutsukura Y. Machi

Year: 1986 Journal: Applied Physics B Vol: 41 (2)Pages: 103-108 Publisher: Springer Science+Business Media

DOI: 10.1007/bf00702661

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Keywords:

Materials science Chemical vapor deposition Amorphous silicon Amorphous solid Substrate (aquarium) Impurity Silicon Schottky diode Ultraviolet Doping Photoelectric effect Analytical Chemistry (journal) Chemical engineering Optoelectronics Crystalline silicon Diode Crystallography Chemistry

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photo-chemical vapor deposition of hydrogenated amorphous silicon films

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