JOURNAL ARTICLE

Photo-chemical vapor deposition of hydrogenated amorphous silicon films

Nobuki MutsukuraY. Machi

Year: 1986 Journal:   Applied Physics B Vol: 41 (2)Pages: 103-108   Publisher: Springer Science+Business Media
Keywords:
Materials science Chemical vapor deposition Amorphous silicon Amorphous solid Substrate (aquarium) Impurity Silicon Schottky diode Ultraviolet Doping Photoelectric effect Analytical Chemistry (journal) Chemical engineering Optoelectronics Crystalline silicon Diode Crystallography Chemistry

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5
Cited By
1.38
FWCI (Field Weighted Citation Impact)
18
Refs
0.81
Citation Normalized Percentile
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Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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