Fabrication of High-Quality Boron-Doped Microcrystalline Silicon Thin Films on Several Types of Substrates

Yunfeng Yin; Jidong Long; Selvaraj Venkataraj; Juan Wang; Armin G. Aberle

doi:10.1016/j.egypro.2012.07.005

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Fabrication of High-Quality Boron-Doped Microcrystalline Silicon Thin Films on Several Types of Substrates

Yunfeng Yin Jidong Long Selvaraj Venkataraj Juan Wang Armin G. Aberle

Year: 2012 Journal: Energy Procedia Vol: 25 Pages: 34-42 Publisher: Elsevier BV

DOI: 10.1016/j.egypro.2012.07.005

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Abstract

10.1016/j.egypro.2012.07.005

Keywords:

Materials science Crystallinity Thin film Substrate (aquarium) Amorphous solid Silicon Fabrication Doping Amorphous silicon Layer (electronics) Nucleation Surface roughness Boron Optoelectronics Composite material Chemical engineering Nanotechnology Crystalline silicon Crystallography Chemistry

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Fabrication of High-Quality Boron-Doped Microcrystalline Silicon Thin Films on Several Types of Substrates

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