Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

Yousong Gu; Y.P Zhang; Zongfan Duan; Xiangpeng Chang; Zhen Tian; Dayong Shi; Long Ma; X.F Zhang; Yuan Liao

doi:10.1016/s0921-5093(99)00212-9

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Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

Yousong Gu Y.P Zhang Zongfan Duan Xiangpeng Chang Zhen Tian Dayong Shi Long Ma X.F Zhang Yuan Liao

Year: 1999 Journal: Materials Science and Engineering A Vol: 271 (1-2)Pages: 206-212 Publisher: Elsevier BV

DOI: 10.1016/s0921-5093(99)00212-9

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Keywords:

Chemical vapor deposition Materials science Combustion chemical vapor deposition Metal Microwave Plasma-enhanced chemical vapor deposition Plasma Carbon film Deposition (geology) Chemical engineering Thin film Nanotechnology Metallurgy Computer science

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

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