Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Jinchun Jiang; Wenjuan Cheng; Yang Zhang; Minbo Lan; Hesun Zhu; Dezhong Shen

doi:10.1016/j.matlet.2006.08.056

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Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Jinchun Jiang Wenjuan Cheng Yang Zhang Minbo Lan Hesun Zhu Dezhong Shen

Year: 2006 Journal: Materials Letters Vol: 61 (11-12)Pages: 2243-2246 Publisher: Elsevier BV

DOI: 10.1016/j.matlet.2006.08.056

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Keywords:

X-ray photoelectron spectroscopy Materials science Raman spectroscopy Chemical vapor deposition Tetragonal crystal system Analytical Chemistry (journal) Crystallite Thin film Scanning electron microscope Carbon film Phase (matter) Crystallography Crystal structure Nanotechnology Chemical engineering Optics Chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Boron and Carbon Nanomaterials Research

Physical Sciences → Materials Science → Materials Chemistry

Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

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