JOURNAL ARTICLE

Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

Srinivasan GuruvenketG. Mohan Rao

Year: 2003 Journal:   Materials Science and Engineering B Vol: 106 (2)Pages: 172-176   Publisher: Elsevier BV
Keywords:
Partial pressure Materials science Tungsten Sputter deposition Nitride Electrical resistivity and conductivity Sputtering Thin film Biasing Analytical Chemistry (journal) Substrate (aquarium) Metallurgy Chemistry Composite material Nanotechnology Layer (electronics) Voltage Electrical engineering Oxygen

Metrics

30
Cited By
3.10
FWCI (Field Weighted Citation Impact)
15
Refs
0.89
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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