Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

Srinivasan Guruvenket; G. Mohan Rao

doi:10.1016/j.mseb.2003.09.016

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Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

Srinivasan Guruvenket G. Mohan Rao

Year: 2003 Journal: Materials Science and Engineering B Vol: 106 (2)Pages: 172-176 Publisher: Elsevier BV

DOI: 10.1016/j.mseb.2003.09.016

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Keywords:

Partial pressure Materials science Tungsten Sputter deposition Nitride Electrical resistivity and conductivity Sputtering Thin film Biasing Analytical Chemistry (journal) Substrate (aquarium) Metallurgy Chemistry Composite material Nanotechnology Layer (electronics) Voltage Electrical engineering Oxygen

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Bias induced structural changes in tungsten nitride films deposited by unbalanced magnetron sputtering

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