JOURNAL ARTICLE

Magnetron facing target sputtering system for fabricating single-crystal films

Can LinDayin SunShuangjie MingE.Y. JiangY.G. Liu

Year: 1996 Journal:   Thin Solid Films Vol: 279 (1-2)Pages: 49-52   Publisher: Elsevier BV
Keywords:
Sputtering Sputter deposition Materials science Substrate (aquarium) Cavity magnetron Deposition (geology) Optoelectronics Ferromagnetism Inert Crystal (programming language) High-power impulse magnetron sputtering Plasma Thin film Nanotechnology Computer science Chemistry Condensed matter physics Physics Geology Nuclear physics

Metrics

32
Cited By
0.69
FWCI (Field Weighted Citation Impact)
9
Refs
0.64
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Ion-surface interactions and analysis
Physical Sciences →  Engineering →  Computational Mechanics
Microstructure and mechanical properties
Physical Sciences →  Materials Science →  Materials Chemistry

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