Magnetron facing target sputtering system for fabricating single-crystal films

Can Lin; Dayin Sun; Shuangjie Ming; E.Y. Jiang; Y.G. Liu

doi:10.1016/0040-6090(95)08124-0

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Magnetron facing target sputtering system for fabricating single-crystal films

Can Lin Dayin Sun Shuangjie Ming E.Y. Jiang Y.G. Liu

Year: 1996 Journal: Thin Solid Films Vol: 279 (1-2)Pages: 49-52 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(95)08124-0

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Keywords:

Sputtering Sputter deposition Materials science Substrate (aquarium) Cavity magnetron Deposition (geology) Optoelectronics Ferromagnetism Inert Crystal (programming language) High-power impulse magnetron sputtering Plasma Thin film Nanotechnology Computer science Chemistry Condensed matter physics Physics Geology Nuclear physics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Microstructure and mechanical properties

Physical Sciences → Materials Science → Materials Chemistry

Magnetron facing target sputtering system for fabricating single-crystal films

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