JOURNAL ARTICLE

Hysteresis behavior during facing target magnetron sputtering

Florian CougnonK. StrijckmansR. SchelfhoutDiederik Depla

Year: 2016 Journal:   Surface and Coatings Technology Vol: 294 Pages: 215-219   Publisher: Elsevier BV
Keywords:
Sputtering Hysteresis Materials science Critical point (mathematics) Sputter deposition High-power impulse magnetron sputtering Position (finance) Point (geometry) Deposition (geology) Chemical physics Nanotechnology Condensed matter physics Thin film Physics Geometry

Metrics

8
Cited By
1.04
FWCI (Field Weighted Citation Impact)
41
Refs
0.77
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Ion-surface interactions and analysis
Physical Sciences →  Engineering →  Computational Mechanics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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