Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor deposition

Pedro Alpuim; V. Chu; J. P. Conde

doi:10.1116/1.1385910

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Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor deposition

Pedro Alpuim V. Chu J. P. Conde

Year: 2001 Journal: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Vol: 19 (5)Pages: 2328-2334 Publisher: American Institute of Physics

DOI: 10.1116/1.1385910

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Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation P. Alpuim, V. Chu, J. P. Conde; Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor deposition. Journal of Vacuum Science & Technology A 1 September 2001; 19 (5): 2328–2334. https://doi.org/10.1116/1.1385910 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search

Keywords:

Icon Microcrystalline Chemical vapor deposition Substrate (aquarium) Doping Materials science Citation Silicon Amorphous silicon Nanotechnology Computer science Engineering physics World Wide Web Optoelectronics Chemistry Physics Crystallography Crystalline silicon Geology

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Topics

Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor deposition

Abstract

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