Amorphous-to-Microcrystalline Silicon Transition in Hot-Wire Chemical Vapor Deposition

P. Brogueira; V. Chu; J. P. Conde

doi:10.1557/proc-377-57

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Amorphous-to-Microcrystalline Silicon Transition in Hot-Wire Chemical Vapor Deposition

P. Brogueira V. Chu J. P. Conde

Year: 1995 Journal: MRS Proceedings Vol: 377 Publisher: Cambridge University Press

DOI: 10.1557/proc-377-57

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Keywords:

Materials science Chemical vapor deposition Silane Torr Silicon Hydrogen Analytical Chemistry (journal) Amorphous solid Raman spectroscopy Substrate (aquarium) Microcrystalline Thin film Amorphous silicon Impurity Nanocrystalline silicon Crystalline silicon Crystallography Nanotechnology Chemistry Metallurgy Composite material Optics Organic chemistry

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Metallic Glasses and Amorphous Alloys

Physical Sciences → Engineering → Mechanical Engineering

Amorphous-to-Microcrystalline Silicon Transition in Hot-Wire Chemical Vapor Deposition

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