Optical and electronic properties of microcrystalline silicon deposited by hot-wire chemical vapor deposition

Daxing Han; Hitoe Habuchi; Tatsuya HORI; A Nishibe; Takeshi Namioka; Jing Lin; Guozhen Yue

doi:10.1016/s0022-3093(99)00835-2

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Optical and electronic properties of microcrystalline silicon deposited by hot-wire chemical vapor deposition

Daxing Han Hitoe Habuchi Tatsuya HORI A Nishibe Takeshi Namioka Jing Lin Guozhen Yue

Year: 2000 Journal: Journal of Non-Crystalline Solids Vol: 266-269 Pages: 274-278 Publisher: Elsevier BV

DOI: 10.1016/s0022-3093(99)00835-2

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Keywords:

Raman spectroscopy Chemical vapor deposition Microcrystalline Photoluminescence Absorption (acoustics) Materials science Analytical Chemistry (journal) Silicon Absorption spectroscopy Crystallinity Chemistry Optoelectronics Optics Crystallography

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Silicon and Solar Cell Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Optical and electronic properties of microcrystalline silicon deposited by hot-wire chemical vapor deposition

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