Silicon Nitride Films Formed with DC-Magnetron Reactive Sputtering

N. P. Formigoni

doi:10.1007/978-1-4613-1027-3_17

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Silicon Nitride Films Formed with DC-Magnetron Reactive Sputtering

N. P. Formigoni

Year: 1988 Pages: 235-246

DOI: 10.1007/978-1-4613-1027-3_17

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Keywords:

Materials science Passivation Sputter deposition Ellipsometry Amorphous solid Optoelectronics Substrate (aquarium) Silicon nitride Thin film Silicon Sputtering Nitride Refractive index Silicon oxynitride Analytical Chemistry (journal) Nanotechnology Layer (electronics) Chemistry Crystallography

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Silicon Nitride Films Formed with DC-Magnetron Reactive Sputtering

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