Duo Yue (21498941)Rui-Ming Li (21498944)Hui-Ting Zheng (17850509)Le Yan (7235951)Liang Song (40318)Robert Langer (166824)Mihail Barboiu (1438852)Zhang-Wen Wei (2880263)Ji-Jun Jiang (1678801)Cheng-Yong Su (1639252)
High-purity xenon (Xe) is crucial in semiconductor manufacturing and medical imaging, but trace krypton (Kr) in Xe poses a significant challenge in separation due to their highly similar properties. Traditional gas separation methods are ineffective for Xe/Kr, necessitating innovative adsorbent materials. This study proposes an effective strategy using halogen-functionalized ligands to adjust the pore size and polarity in metal–organic framework (MOF) materials, achieving efficient Xe/Kr separation. A series of MOFs (LIFM-DMOF-X1, X = F, Cl, Br, I) were designed to simultaneously control pore size and wall polarity. Experimental results show that LIFM-DMOF-Cl1 and LIFM-DMOF-Br1 exhibit excellent adsorption performance and selectivity for Xe/Kr. Theoretical calculations confirm stronger Xe interactions with MOF C–H groups and halogen atoms, validating the structure–property relationship. This approach provides a synergistic strategy for developing particular gas separation materials for Xe/Kr.
Di YueRuiming LiHui-Ting ZhengLe YanLiang SongRóbert LangerMihail BãrboiuZhang-Wen WeiJi‐Jun JiangCheng‐Yong Su
Yuting YangChang‐Zheng TuLicheng GuoLi WangF. S. ChengFeng Luo
Shanshan LiuXin LianBin YueShutao XuGuangjun WuYuchao ChaiYing‐Hui ZhangLandong Li
P.E. RyanOmar K. FarhaLinda J. BroadbeltRandall Q. Snurr
Oscar Iu-Fan Chen (17810776)Neda S. Sabeva (22085340)Tianqiong Ma (4832613)Andrey A. Bardin (2123311)Brent L. Nannenga (263586)Zichao Rong (10048707)Zhiling Zheng (14193330)Omar M. Yaghi (1288965)