Di YueRuiming LiHui-Ting ZhengLe YanLiang SongRóbert LangerMihail BãrboiuZhang-Wen WeiJi‐Jun JiangCheng‐Yong Su
High-purity xenon (Xe) is crucial in semiconductor manufacturing and medical imaging, but trace krypton (Kr) in Xe poses a significant challenge in separation due to their highly similar properties. Traditional gas separation methods are ineffective for Xe/Kr, necessitating innovative adsorbent materials. This study proposes an effective strategy using halogen-functionalized ligands to adjust the pore size and polarity in metal-organic framework (MOF) materials, achieving efficient Xe/Kr separation. A series of MOFs (LIFM-DMOF-X1, X = F, Cl, Br, I) were designed to simultaneously control pore size and wall polarity. Experimental results show that LIFM-DMOF-Cl1 and LIFM-DMOF-Br1 exhibit excellent adsorption performance and selectivity for Xe/Kr. Theoretical calculations confirm stronger Xe interactions with MOF C-H groups and halogen atoms, validating the structure-property relationship. This approach provides a synergistic strategy for developing particular gas separation materials for Xe/Kr.
Duo Yue (21498941)Rui-Ming Li (21498944)Hui-Ting Zheng (17850509)Le Yan (7235951)Liang Song (40318)Robert Langer (166824)Mihail Barboiu (1438852)Zhang-Wen Wei (2880263)Ji-Jun Jiang (1678801)Cheng-Yong Su (1639252)
Yuting YangChang‐Zheng TuLicheng GuoLi WangF. S. ChengFeng Luo
Zhaotong Yan (9651374)Youjin Gong (9651377)Chu-Ting Yang (1701946)Xiaonan Wu (693482)Boyu Liu (845140)Qiang Liu (166143)Shunshun Xiong (1446802)Shuming Peng (1484953)
Zhaotong YanYoujin GongChu‐Ting YangXiaonan WuBoyu LiuQiang LiuShunshun XiongShuming Peng
Xing-Ping FuQianqian ChenJianfeng ZhuWei‐Fang SuXiaobing Yang