Characterization of Low-k Interconnect Dielectrics by EELS

Yuji Otsuka; Miyako Shimada; Naohiko Kawasaki; Shinichi Ogawa

doi:10.7567/ssdm.2006.g-2-4

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Characterization of Low-k Interconnect Dielectrics by EELS

Yuji Otsuka Miyako Shimada Naohiko Kawasaki Shinichi Ogawa

Year: 2006

DOI: 10.7567/ssdm.2006.g-2-4

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Keywords:

Materials science Characterization (materials science) Dielectric Interconnection Optoelectronics Nanotechnology Engineering physics Computer science Telecommunications Engineering

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Characterization of Low-k Interconnect Dielectrics by EELS

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