Deposition of hydrogenated amorphous carbon films from CH4/Ar plasmas: Ar dilution effects

Luca Valentini; J. M. Kenny; G. Mariotto; Paolo Tosi

doi:10.1023/a:1012422618327

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Deposition of hydrogenated amorphous carbon films from CH4/Ar plasmas: Ar dilution effects

Luca Valentini J. M. Kenny G. Mariotto Paolo Tosi

Year: 2001 Journal: Journal of Materials Science Vol: 36 (21)Pages: 5295-5300 Publisher: Springer Science+Business Media

DOI: 10.1023/a:1012422618327

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Keywords:

Materials science Raman spectroscopy Glow discharge Amorphous solid Analytical Chemistry (journal) Amorphous carbon Argon Carbon film Chemical composition Carbon fibers Plasma Chemical engineering Thin film Composite material Nanotechnology Crystallography Optics Composite number Organic chemistry Chemistry

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Deposition of hydrogenated amorphous carbon films from CH4/Ar plasmas: Ar dilution effects

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