Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering

V. S. Sulyaeva; Mikhail M. Syrokvashin; A. K. Kozhevnikov; Е. N. Ermakova

doi:10.1134/s0020168524700948

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Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering

V. S. Sulyaeva Mikhail M. Syrokvashin A. K. Kozhevnikov Е. N. Ermakova

Year: 2024 Journal: Inorganic Materials Vol: 60 (6)Pages: 723-730 Publisher: Pleiades Publishing

DOI: 10.1134/s0020168524700948

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Keywords:

Sputtering Materials science Sputter deposition Cavity magnetron Chemical engineering Analytical Chemistry (journal) Chemistry Nanotechnology Thin film Environmental chemistry Engineering

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Growth of TiSiN Films by Room-Temperature Reactive Magnetron Sputtering

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