Nanostructured Chromium PVD Thin Films Fabricated Through Copper–Chromium Selective Dissolution

Abstract

This study investigates the fabrication of nanostructured chromium thin films via selective dissolution of PVD-deposited Cu–Cr thin films. The effects of the deposition parameters on the structural, chemical, and morphological properties of the films are systematically analyzed. Starting from a thin film composed of 50 wt.% chromium and 50 wt.% copper, deposited onto a substrate pre-heated to 300 °C, we demonstrate that the following dealloying process carried out in a diluted nitric acid solution yields nanostructured chromium films with high porosity, large surface area, enhanced wettability and neglectable copper content. These findings underline the critical influence of the deposition temperature and alloy composition on achieving optimal film properties.