Anneal-free ultra-low loss silicon nitride integrated photonics

Debapam Bose; Mark Harrington; Andrei Isichenko; Kaikai Liu; Jiawei Wang; Nitesh Chauhan; Zachary L. Newman; Daniel J. Blumenthal

doi:10.1038/s41377-024-01503-4

JOURNAL ARTICLE

Anneal-free ultra-low loss silicon nitride integrated photonics

Debapam Bose Mark Harrington Andrei Isichenko Kaikai Liu Jiawei Wang Nitesh Chauhan Zachary L. Newman Daniel J. Blumenthal

Year: 2024 Journal: Light Science & Applications Vol: 13 (1)Pages: 156-156 Publisher: Springer Nature

DOI: 10.1038/s41377-024-01503-4

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Keywords:

Materials science Silicon nitride Nitride Optoelectronics Photonics Annealing (glass) Lithium niobate Cladding (metalworking) Silicon Nanotechnology Composite material

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Advanced Fiber Laser Technologies

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photorefractive and Nonlinear Optics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Anneal-free ultra-low loss silicon nitride integrated photonics

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