In this study, the doping effect of 4-NBD and $\text{Br}_{2}$ molecules on the solution-processed $\text{WSe}_{2}$ thin-film transistors is investigated. $\text{Br}_{2}$ -doped $\text{WSe}_{2}$ transistors showed field-effect hole mobility of more than $12 \text{cm}^{2}\mathrm{V}^{-1}\mathrm{s}^{-1}$ , which is 2 orders of magnitude higher than that of the nitrobenzenediazonium tetrafluoroborate (4-NBD)-doped device. Our results indicate that molecule type and size are important to realize effective doping and operational stability on solution-processed $\text{WSe}_{2}$ transistors for future applications in integrated flexible electronics.
Taoyu ZouHyun‐Jun KimSoonhyo KimAo LiuMin‐Yeong ChoiHaksoon JungHuihui ZhuInsang YouYoujin ReoWoo‐Ju LeeYong‐Sung KimCheol‐Joo KimYong‐Young Noh
Taoyu ZouSeongmin HeoAo LiuGwon ByeonHuihui ZhuYong‐Young Noh
Sagar R. BhaleraoDonald LupoPaul R. Berger