Two-photon shape-modulated maskless lithography of positive photoresist of S1813

Qianhua Li; Guo-Juan Xu; Chang Cheng; Rong Zou; Xiaojie Li; R. Ma; Hong-Zhong Cao

doi:10.1016/j.optmat.2023.113509

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Two-photon shape-modulated maskless lithography of positive photoresist of S1813

Qianhua Li Guo-Juan Xu Chang Cheng Rong Zou Xiaojie Li R. Ma Hong-Zhong Cao

Year: 2023 Journal: Optical Materials Vol: 137 Pages: 113509-113509 Publisher: Elsevier BV

DOI: 10.1016/j.optmat.2023.113509

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Keywords:

Maskless lithography Photoresist Lithography Materials science Optics Photolithography Optoelectronics Next-generation lithography Multiple patterning Wafer Fabrication Nanotechnology Resist Electron-beam lithography Physics

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Nonlinear Optical Materials Studies

Physical Sciences → Engineering → Biomedical Engineering

Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Orbital Angular Momentum in Optics

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Two-photon shape-modulated maskless lithography of positive photoresist of S1813

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